Ultra-pure water machine
Product introduction
1、Definition and standard of ultrΩ≤a-pure water machine
Ultrapure Water (UPW) ↓≤ Ultrapure water (UPW ♦¥♦) ** refers to high-pu→&rity water with a res©β✔istivity ≥18.2 MΩ·cm (25 ° C), to×★tal organic carbon (TOC) ≤5 ppb, an×ε©d particulate matter ≤1 /mL, almo÷φ¶st free of ions, microorganisms, and or™≠ganic matter.
2、Core process and equipment comλ∞♣position
Pretreatment system:
Multi-media filter: rem '©§oval of suspended solids, colloi >£✔ds.
Activated carbon filter: adsorpt®¥ion of residual chlorine, organic ma™→tter.
Softener: removes calcium and magnesiu™m ions (anti-scaling).
Reverse Osmosis (RO) ★♣↑systems:
97%-99% of the ions and φ∏organic matter are removed, ₹and the conductivity of the produceδ←γ♥d water is less than 10 μS/c×γ₽m.
Electrical deionization (EDI) systemsδ$♣:
Further purificationαφ™ to a resistivity ≥15 MΩ·cm ↔₹was achieved by ion-excδ£hange membrane and electδΩric field.
Post-processing system:≥¶λ
Ultraviolet sterilization (UV) ¶≥λ∞: Inactivates microorganisms.
Ultrafiltration (UF) : re→→$moval of pyrogen, nanoscale particl♠Ω¥es.
Polishing mixed bed: ↕final purification, up to 1γ™8.2 MΩ·cm.
3、Key performance paraΩ→meters
Parameter Typical values/Description
Water production resistivity ≥18.2 MΩ·c×®α✘m (25℃)
TOC content ≤5 ppb
Particulate matter (≥0.1μm) ≤1 /mL
Water yield 0.5 m³/ H-100 m³/h (custo©★mized on demand)
Recovery rate 60%-85% (depending on ÷∑raw water quality)
Operating pressure RO systπ€em: 1.0-1.5MPa; EDI s♠≥₽ystem: 0.2-0.7MPa
4、Application field
Optical industry
Cleaning of various lenses.
Semiconductor Manufa≠✘♣✔cturing:
Wafer cleaning, photoresist di←$₽lution, required res∏$σistivity ≥18.2 MΩ·cm, TOCσ↔≤1 ppb.
Biomedicine:
Water for injection (WFI) aδ£$♣nd biological agents are pro§∑✘duced in accordance with ≤↕GMP standards.
Laboratory:
Analytical instruments (HPLC, ICP&↓-MS) use water to avoid back♠©ground interference.
Pv and Lithium:
Solar silicon wafer cleα£aning, electrolyte preparation.
Product advantages
1、advanced equipment technolog™&y, exquisite workmanship•Ω
2、Long normal service life, h€♣&$igh pass rate, to the technical &♥♣≥level of imported equipment, more →₽cost-effective.
3、our company has nea>✔≤rly 20 years of experience in ε ∑technical and after-sal©&¶es service team, from desig →§✔n and production to aft•α₹er-sales service to provide customeδ&≈rs with professional solutions.≤∞
5、Selection and maintenance ≥ '>suggestions
Key points of selection:
Water quality requirements: The semic₹£€₽onductor industry needs 18.2 MΩ·cm, β the pharmaceutical industry can re¶§δ>lax to 15 MΩ·cm.
Water yield: +20% redund∑→ancy based on peak water consum←¶¥λption of production line.
Energy consumption: High efficie®≈±ncy RO membrane and low eφ&₹nergy EDI module are preferred.
Maintenance:
Daily: Check the pressure, flow, an€≥λ¥d conductivity parameters an>≈d record running logs.
Monthly: Clean the RO membrane (chemi•λ$ cal cleaning or reverse washing) an♦↑d replace the pretreatment filter eleme∞←nt.
Annual: EDI module ion exchange resin☆<→ replacement, sensor calibratiλ↕ on.
6、Common problems and solutions
Problem cause analysis solutio®₩ ≈n
The particle settling stirring↑ speed is insufficient ×σ×εor the time is too short to increase t★∑↑he rotational speed an→€&d prolong the stirring time"♥
Temperature fluctuation large jacket me'® dium uneven flow check pump£ε valve, adjust flow
Seal leakage seal ring aginπ×g or improper installation Replace t♣ ÷he seal ring, recalibrate✘¥ the shaft
Motor overheating load is too larε★≈ge or poor heat dissipation reduce t™↔ he speed, clean the heat dissipatio€→'n fan
7、Technological development trends
Intelligent: The Internet of Thing φs (IoT) monitors water quality in≈÷ real time, and AI predicts ←↕↕≤membrane life.
Green energy saving: Devγ₹×elop low waste liquid dis♠$→charge process, improve water ¥¶recovery rate to more than 90%.
Integration: Ultra-pure water equi §↔pment is directly coupled to the pro←₽<₽duction line to reduce the risk♦∑ of water pollution.
For more models of pr ®≈oducts, please contact us. ✘ We will be happy to se©rve you!
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